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An electrostatic wall probe in a flow of cool plasma

An electrostatic wall probe in a flow of cool plasma provlda~ g~od ~=ope for prQ~uclng ma~rials and coatings by vacuum condensation from plasma flows at high and adjustable particle energies [4-6, ii]. LITERATURE CITED i. L.A. Artslmovich et el. (editors), Plasma Accelerators [in Russian], Mashinostroenie, Moscow (1973). 2. A. I. Morozov (editor), Physics and Applications of Plasma Accelerators [in Russian], Nauka i Tekhnika, Minsk (1974). 3. A. M. Dorodnov, "Some applications of plasma accelerators in technology," in: Physics and Applications of Plasma Accelerators [in Russian], Nauka i Tekhnika, Minsk (1974). 4. I. G. Blinov, A. M. Dorodnov, V. E. Minaichev, et el., High-Current Vacuum Plasma De- vices and Applications in Microelectronic Equipment. Part 2. High-Energy Plasma Tech- nology. Surveys on Electronlcs [in Russian], Izd. TsNII Elektronika, No. 8, Moscow (1974). 5. A.M. Dorodnov, Industrial Plasma Sources (Textbook) [in Russian], N. E. Bauman Moscow Higher Technical School (1976). 6. I.G. Blinov, A. M. Dorodnov, V. E. Minaichev, et al., High-Current Vacuum Plasma De- vices and Applications in Microelectronic Equipment. Part i. Physical Principles. Surveys on Electronics [in Russian], No. 7, Izd. TsNII Elektronlka, Moscow (1974). 7. U.S. Patent, class 204-192, No. 3,625,848 (1971). 8. V. E. Minaichev and S. I. Miroshkin, Stationary High-Current Plasma Evaporators for Metals and Alloys. Surveys http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Journal of Applied Mechanics and Technical Physics Springer Journals

An electrostatic wall probe in a flow of cool plasma

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References (12)

Publisher
Springer Journals
Copyright
Copyright
Subject
Physics; Classical Mechanics; Fluid- and Aerodynamics; Classical and Continuum Physics; Applications of Mathematics; Mathematical Modeling and Industrial Mathematics; Mechanical Engineering
ISSN
0021-8944
eISSN
1573-8620
DOI
10.1007/BF00911567
Publisher site
See Article on Publisher Site

Abstract

provlda~ g~od ~=ope for prQ~uclng ma~rials and coatings by vacuum condensation from plasma flows at high and adjustable particle energies [4-6, ii]. LITERATURE CITED i. L.A. Artslmovich et el. (editors), Plasma Accelerators [in Russian], Mashinostroenie, Moscow (1973). 2. A. I. Morozov (editor), Physics and Applications of Plasma Accelerators [in Russian], Nauka i Tekhnika, Minsk (1974). 3. A. M. Dorodnov, "Some applications of plasma accelerators in technology," in: Physics and Applications of Plasma Accelerators [in Russian], Nauka i Tekhnika, Minsk (1974). 4. I. G. Blinov, A. M. Dorodnov, V. E. Minaichev, et el., High-Current Vacuum Plasma De- vices and Applications in Microelectronic Equipment. Part 2. High-Energy Plasma Tech- nology. Surveys on Electronlcs [in Russian], Izd. TsNII Elektronika, No. 8, Moscow (1974). 5. A.M. Dorodnov, Industrial Plasma Sources (Textbook) [in Russian], N. E. Bauman Moscow Higher Technical School (1976). 6. I.G. Blinov, A. M. Dorodnov, V. E. Minaichev, et al., High-Current Vacuum Plasma De- vices and Applications in Microelectronic Equipment. Part i. Physical Principles. Surveys on Electronics [in Russian], No. 7, Izd. TsNII Elektronlka, Moscow (1974). 7. U.S. Patent, class 204-192, No. 3,625,848 (1971). 8. V. E. Minaichev and S. I. Miroshkin, Stationary High-Current Plasma Evaporators for Metals and Alloys. Surveys

Journal

Journal of Applied Mechanics and Technical Physics – Springer Journals

Published: Dec 15, 2004

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